Thin film materials

From display panels to AI semiconductor chips — precision thin-film materials by LT Metal.

Overview

Hybrid Target Overview

Today’s display panels demand improved visibility through suppression of ambient light reflection, as well as simpler processes. Building on composite sintering technology that precisely controls metal and ceramic phases, LT Metal offers WOx- and MOx-based metal–oxide target materials for high-performance thin-film applications such as black matrix replacement and low-reflection interconnect layers, delivering stable conductivity and low reflectance at the same time to meet our customers’ expectations.

Industry Product Composition Purity Shape Main Applications
Display MOX On request 3N5 or higher Planer & Rotary Small/medium panels, low-reflection layer
WOX On request 4N or higher Planer Large panels, low-reflection layer

Why LT Metal

Three engineering capabilities

Global customers choose LT Metal because our engineering capability in composition, structure, and reliability delivers the performance and quality they specify. That is our core strength.

We engineer composition.

The alloy composition and impurity level of a target directly determine the electrical and optical properties of the film. LT Metal analyzes your deposition conditions — temperature, pressure, and power density — and engineers a target with the composition to match.

We engineer structure.

Our proprietary technology synthesizes the powders for ITO and other functional targets in-house, so particle size distribution, oxygen content, and sintered density are engineered from the start. The result is a target structure that suppresses particle generation and arcing.

We engineer reliability.

We do more than supply material. We engineer a reliability support system around your deposition process: process condition reviews, prototype evaluation, and root-cause analysis when problems arise.

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